Attwood, David T. <br/><br/>
Soft x-rays and extreme ultraviolet radiation  principles and applications / 
David Attwood. 
 - Cambridge ;  New York :  Cambridge University Press,  (c)2000. 
 - 1 online resource (xvi, 470 pages) :  illustrations (some color). 
<br/><br/>Includes bibliographies and index. 
<br/><br/> Introduction --  Radiation and Scattering at EUV and Soft X-Ray Wavelengths --  Wave Propagation and Refractive Index at EUV and Soft X-Ray Wavelengths --  Multilayer Interference Coatings --  Synchrotron Radiation --  Physics of Hot Dense Plasmas --  Extreme Ultraviolet and Soft X-Ray Lasers --  Coherence at Short Wavelengths --  Soft X-Ray Microscopy with Diffractive Optics --  Extreme Ultraviolet and X-Ray Lithography 
<br/><br/> "This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy."--BOOK JACKET. "The book will be of interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science."--BOOK JACKET. 
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<br/><br/><label>ISBN: </label>9781139648936 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Grenz rays.<br/>Ultraviolet radiation.<br/>Grenz rays--Industrial applications.<br/>Ultraviolet radiation--Industrial applications.
<br/><br/><label>Index Terms--Genre/Form: </label><br/>Electronic Books.
<br/><br/><label>LC Class. No.: </label>QC482  / .S648 2000